SPIE Advanced Lithography 2027 Conference & Exhibition is dedicated to research and development in resists, optical lithography, EUV, metrology, double patterning, immersion, imprint lithography and DFM.
Key Topics
- Alternative Lithographic Technologies
- Extreme Ultraviolet (EUV) Lithography
- Advances in Resist Materials and Processing Technology
- Metrology, Inspection, and Process Control for Microlithography
- Design for Manufacturability through Design-Process Integration
- Optical Microlithography
- Technical short courses on topics ranging from lithography fundamentals to emerging approaches including Directed Self Assembly (DSA) and EUV lithography
The exhibition covers the latest technology in advanced lithography, including:
- Metrology, inspection, OPC, and process control
- Lithography: double patterning, immersion, EUV, e-beam, RET and optical/laser
- Materials and chemicals
- Design and manufacturing software
- Lasers
- Imaging equipment
- Nano-imprint
- Resist materials and processing
- Nanoscale imaging
- IC and chip fabrication
Who should Attend
More than 4,000 attendees and about 50 exhibitors, representing researchers and managers working in the lithography industry, semiconductor suppliers, integrators, and manufacturers.
