SPIE Advanced Lithography 2020 Conference & Exhibition is dedicated to research and development in resists, optical lithography, EUV, metrology, double patterning, immersion, imprint lithography and DFM.
Advances in Resist Materials and Processing Technology
Metrology, Inspection, and Process Control for Microlithography
Design for Manufacturability through Design-Process Integration
Technical short courses on topics ranging from lithography fundamentals to emerging approaches including Directed Self Assembly (DSA) and EUV lithography
The exhibition covers the latest technology in advanced lithography, including:
Metrology, inspection, OPC, and process control
Lithography: double patterning, immersion, EUV, e-beam, RET and optical/laser
Materials and chemicals
Design and manufacturing software
Resist materials and processing
IC and chip fabrication
SPIE Advanced Lithography 2020 Conference & Exhibition brings together more than 4,000 attendees and about 50 exhibitors, representing researchers and managers working in the lithography industry, semiconductor suppliers, integrators, and manufacturers.
SPIE Advanced Lithography 2020 Conference & Exhibition will be held in San Jose, CA, United States on 23-27 February 2020.
San Jose McEnery Convention Center
150 West San Carlos St.
, San Jose, California, United States