SPIE Advanced Lithography 2021

  • 21-25 Feb 2021
  • Marriott San Jose, CA, United States

Description

SPIE Advanced Lithography 2021 is a conference and exhibition that addresses the challenges presented in fabricating next-generation integrated circuits and covers topics such as:

  • Alternative Lithographic Technologies
  • Extreme Ultraviolet (EUV) Lithography
  • Advances in Patterning Materials and Processes
  • Metrology, Inspection, and Process Control for Microlithography
  • Design-Process-Technology Co-optimization for Manufacturability
  • Optical Microlithography
  • Advanced Etch Technology for Nanopatterning

SPIE Advanced Lithography 2021 brings together the lithography community, including researchers and managers working in the lithography industry.

SPIE Advanced Lithography 2021 will be held in San Jose, CA, United States on 21-25 Feb 2021.

Venue

  • Marriott San Jose, 301 South Market Street, San Jose, California, United States

More Details

Prices:
500-1000 US Dollar
Exhibition:
Included
Organizer:
SPIE - The International Society for Optics and Photonics
Website:

Future Events

  • SPIE Advanced Lithography 2021 - 21-25 Feb 2021, Marriott San Jose, San Jose, CA, United States (11000)
  • SPIE Advanced Lithography 2022 - Feb 2022, San Jose, CA, United States (16099)

Past Events

  • SPIE Advanced Lithography 2020 - 23-27 Feb 2020, San Jose McEnery Convention Center, San Jose, CA, United States (1078)
  • SPIE Advanced Lithography 2019 - 24-28 Feb 2019, San Jose McEnery Convention Center, San Jose, CA, United States (34239)
  • SPIE Advanced Lithography 2018 - 25 Feb - 01 Mar, 2018, San Jose McEnery Convention Center, San Jose, CA, United States (23670)

Important

Please, check the official conference website for possible changes, before you make any traveling arrangements

Prices are for evaluation only.

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