SPIE Advanced Lithography 2027 Conference & Exhibition

SPIE Advanced Lithography 2027 Conference & Exhibition is dedicated to research and development in resists, optical lithography, EUV, metrology, double patterning, immersion, imprint lithography and DFM.

Key Topics

• Alternative Lithographic Technologies
• Extreme Ultraviolet (EUV) Lithography
• Advances in Resist Materials and Processing Technology
• Metrology, Inspection, and Process Control for Microlithography
• Design for Manufacturability through Design-Process Integration
• Optical Microlithography
• Technical short courses on topics ranging from lithography fundamentals to emerging approaches including Directed Self Assembly (DSA) and EUV lithography

The exhibition covers the latest technology in advanced lithography, including:

• Metrology, inspection, OPC, and process control
• Lithography: double patterning, immersion, EUV, e-beam, RET and optical/laser
• Materials and chemicals
• Design and manufacturing software
• Lasers
• Imaging equipment
• Nano-imprint
• Resist materials and processing
• Nanoscale imaging
• IC and chip fabrication

Who should Attend

More than 4,000 attendees and about 50 exhibitors, representing researchers and managers working in the lithography industry, semiconductor suppliers, integrators, and manufacturers.