SPIE Photomask Technology 2015

Key Topics

• Mask Application
  Design for manufacturability, Patterned media, Source and mask optimization, Resolution enhancement techniques and OPC, Simulation and modeling, Double- and multi-patterning.
• Emerging Mask Technologies
  Mask process correction, EUV mask making, Pixelated masks, Direct-write, EUV mask inspection and repair, Nanoimprint mask making, Nanoimprint mask application, ML² and Grey-scale masks, Alternative mask technologies, EUV mask infrastructure.
• Mask Making
  Substrates and materials, contamination, Metrology, haze, Repair, Patterning tools and processes, Etch techniques, Inspection, Simulation of mask making, Mask data preparation, Resist and resist processing , Cleaning.
• Mask Business
  Business aspects of mask, Mask management in wafer fabs and Infrastructure, Mask manufacturing control , Mask shop management.

SPIE Photomask Technology exhibition presents components, software, and manufacturing equipment covering technologies such as: Optical/laser microlithography, Nanotechnology, Software, EUV, Resist technology and processing, Lasers, Electronic imaging components, Metrology and Electron-beam lithography.